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Direct Laser Writers

Direct writing, unlimited possibilities – with POLOS® Direct Layer Writer Systems

Unlock faster innovation with POLOS® Direct Layer Writer Systems, designed to simplify and accelerate your patterning processes. Using advanced direct-write printing technology, these systems eliminate the need for masks or intermediate steps—saving you time, reducing costs, and minimizing process complexity.

Engineered for exceptional precision, efficiency, and versatility, our systems are ideal for cutting-edge applications in electronics, advanced manufacturing, and materials science. Whether you're developing next-gen components or optimizing production workflows, POLOS® delivers the accuracy and speed your work demands.

 

 

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Discover your laser writer solutions

 

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Why choose the POLOS® Direct Laser Writers?

  • No masks, no hassle – Direct-write technology removes intermediate steps for faster, cleaner workflows
  • High precision – Consistent, accurate patterning at micro and nano scale
  • Increased throughput – Accelerate prototyping and production without compromising quality
  • Flexible substrate support – Works seamlessly with a wide range of materials and surface types
  • Cost-effective innovation – Reduce material waste and processing time

 

 

 

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POLOS® PRINT UV STANDARD

The POLOS® Print UV Standard produces any 2D shapes at micron resolution without the need for a hard-mask. It is a maskless lithography tool, based on a Digital Micromirror Device projection technology. The tool is compatible with a wide range of resists and substrates.

  • Writing resolution down to 1.5 μm
  • Adjustable writing field and resolution with exchangeable objectives
  • Compatible with CAD files and bitmap images
  • Compatible with a wide range of substrates

 

 

 

 

 

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POLOS® BEAM

The POLOS® Beam brings high-performance nano-patterning at will to the desktop without compromises in performance. Semi-automatic alignment allows multilayer alignment to be completed within minutes.

  • Full-featured maskless lithography, smaller than a desktop computer
  • Sub-micron resolution while exposes a write field in less than two seconds.
  • Piezo actuators reach focus in less than a second when combined with our closed looped focus optics

 

 

 

 

POLOS® PM-100 Start

Meet the smallest high quality laser beam spot available in the market. It includes a 405 nm optical module capable of writing structures as small as 0.8 μm in photoresist layers.
Sub-micron features, ease of operation and low maintenance.

  • High quality, cost efficient maskless lithography tool
  • Market conform 0.8 μm resolution
  • 375 nm source available for i-Line resists
  • Compact tabletop system which requires minimum cleanroom surface

 

 

 

 

 

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POLOS® PM-100

The POLOS® PM-100 is a versatile UV laser writer with ultra high precision components, specifically designed to give the user the highest degree of freedom to create micro structures in photosensitive layers. The rasterizing principle of the machine ensures proper and constant exposure over the whole surface.

  • Highest resolution in the market with 405 nm laser
  • Minimal maintenance costs
  • Compact optical module: use a spare optical unit for revolutionary machine downtime reduction
  • User-friendly operation

 

 

 

 

Discover high-performance direct laser writers designed for high-quality imaging during the entire exposure process. These systems are user-friendly. Get in touch today to find your ideal maskless lithography equipment.