Maskless lithography removes the limitations of traditional photomasks, allowing patterns to be created instantly without the cost, lead time, or inflexibility of mask production. This makes it an ideal approach for research, development, and rapid design iteration.
POLOS® brings these advantages into a truly compact desktop platform, delivering high-performance maskless lithography without sacrificing resolution, speed, or usability.
At the heart of the system is the POLOS® Beam Engine, which projects submicron features directly onto the substrate. High-precision stepping enables accurate stitching across multiple exposure fields, allowing seamless patterning of substrates up to 6 inches in diameter.
Compact by design/strong>
A complete, professional maskless lithography solution in a footprint smaller than a typical desktop PC.
High-performance exposure
Achieves submicron feature resolution while exposing an entire write field in under two seconds.
Rapid autofocus
Closed-loop focus optics combined with piezo actuators bring the system into focus in under one second, ensuring sharp, repeatable results.
Effortless multilayer alignment
Semi-automatic alignment tools allow multilayer processes to be completed in just minutes, even for complex designs.
Intuitive software workflow
Patterning is fast and straightforward: simply load your design, align the substrate, and expose. The user interface follows familiar CNC-style navigation, making operation intuitive even for new users.
