POLOS

POLOS PrintUV Standard

Product description

The POLOS® Print UV Standard is a maskless lithography equipment, based on a Digital Micromirror Device projection technology (DMD), compatible with a wide range of resists and substrates. This system can produce any 2D shapes at micron resolution without the need for a hard-mask.

Key features

  • Writing resolution down to 1.5 µm
  • Adjustable writing field and resolution with exchangeable objectives
  • Compatible with CAD files or bitmap images
  • Compatible with I, h and g-line photoresists
  • Compatible with a wide range of substrates (silicon, glass, metal, plastic, ...)
  • Compatible with any sample size up to 5” square masks
  • Camera feedback for alignment steps

Key benefits

  • Time and money saving thanks to the absence of a hardmask
  • Intuitive alignment method with a direct overlay of the design on the sample
  • Table-top, with a very small footprint
  • Technology well suited for microelectronics, 2D-materials, microfluidics, optoelectronics, optics or any other 2D micro-fabrication applications
  • Light source: Exposure: 385 nm; alignment: 590 nm
  • Minimum feature size: 1.5 µm
  • Alignment resolution: 2 µm
  • Maximum exposure area: 70 x 70 mm2
  • Substrate size: Up to 100 mm (4") wafers
  • Writing speed: 75 mm2/min
  • System dimensions: 52 (w) x 52 (h) x 69 (d) cm

Applications

  • Microfluidics
  • Microelectronics
  • Optoelectronics
  • Spintronics
  • 2D Materials
  • Biotechnologies

Options and accessories

  • Multiple-sample holder (glass-slide, 4” wafer etc.)
  • Objectives
POLOS

POLOS PrintUV Standard

Compatible with a wide range of resists and substrates
 No need for a hardmask
 Writing resolution down to 1.5 µm
Table-top system with very small foot print

Specifications

Brand
POLOS
Product Number
POLOS-PrintUV-Standard
Max substrate size
100 x 100 mm
Wavelength
2 - 23 µm
Resolution
435 nm
System type
Table-top system
Status
Request information