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Category
Single Point Measurement
(4)Wafer Mapping
(2)Material
Table-top System
Thickness range
15 nm to 100 um
3 nm to 80 um
4 nm - 150 μm
Spectral range
200 nm - 1700 nm
200 nm - 850 nm
370 nm - 1020 nm
Light Source MTBF
2,000 h
2000 h
5,000 h
Wafer Mapping
Automated, ultra-fast & accurate wafer mapping; these tools are ideal for the fast and accurate mapping of film properties: thickness, refractive index, uniformity, color and more.
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Layer Thickness Measurement
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Category
Single Point Measurement
(4)Wafer Mapping
(2)Material
Table-top System
Thickness range
15 nm to 100 um
3 nm to 80 um
4 nm - 150 μm
Spectral range
200 nm - 1700 nm
200 nm - 850 nm
370 nm - 1020 nm
Light Source MTBF
2,000 h
2000 h
5,000 h
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FR-Scanner
Wafer Mapping
POLOS
FR-Scanner is a compact bench-top tool for the automatic characterization of films and coatings on wafers, masks or other substrates. It is ideal for the fast a
3 nm to 100 um
200 nm - 1020 nm
Tabletop System
Webshop
FR-Scanner-AIO-MIC-XY200
Wafer Mapping
POLOS
4 nm - 150 μm
200 nm - 1700 nm
2000 h