Maskless lithography offers on-demand nanopatterning, removing the need for expensive and time-consuming photomasks. The POLOS® BEAM XL builds on this capability, providing a compact, desktop-ready platform without sacrificing performance, making it perfect for research, prototyping, and small-scale production.

At the heart of the system, the POLOS^® Beam Engine projects precise submicron patterns directly onto your substrates. Advanced precision steppers enable smooth stitching across multiple write fields, allowing exposure of substrates up to 6 inches (150 mm) in diameter.

• Compact Design: Full-featured maskless lithography in a footprint smaller than a standard desktop computer.
• High Performance: Submicron resolution with write fields exposed in under two seconds.
• Rapid Autofocus: Piezo-actuated focusing achieves perfect alignment in less than a second using closed-loop optics.
• Easy Multilayer Alignment: Semi-automatic alignment streamlines multilayer processes, enabling completion in minutes.

The included user-friendly software simplifies patterning workflows. Load your design, align the substrate, and start exposure with intuitive controls similar to CNC navigation, making complex nanopatterning fast and accessible.