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POLOS foot pedal (3 pedals)
42870
Accessories & Options
POLOS
POLOS foot pedal (3 pedals)
Hands-free usage
Controlling start/stop
Vacuum activation
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POLOS 450 Advanced
44399
Spin Coaters
POLOS
POLOS 450 Advanced
POLOS 450 Advanced Single Substrate Spin Processor, Desktop version with NPP housing, spincup, manual chemical dispense and heavy duty motor.
Ø460 mm or 10" x 10" square substrates
Desktop
Advanced Series
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Centering Aid
Centering-Aid
Accessories & Options
POLOS
Centering Aid
Centering Aid for easy and accurate alignment of your substrate. For use with the POLOS SPIN150i or SPIN200i spin coaters.
For use with POLOS SPIN150i or SPIN200i
2" up to 6" or 2" up to 8"
N/A
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3 Versions:
Centering Aid (For 200 mm)Centering Aid (For 150 mm)Centering Aid (For 300 mm)
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PTFE Dispense Vessel (complete set)
Dispense Vessel (complete)
Accessories & Options
POLOS
PTFE Dispense Vessel (complete set)
Auto Dispense Lines Full PTFE dispense vessel automated injector line.
Precision Regulator 0.05-2 Bar
Automated injector line
Male Connector
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Drain hose
Drain-hose
Accessories & Options
POLOS
Drain hose
NPP Corrugated Drainhose including connector 1.5 or 5m
1,5 or 5m
Connects to drainport
Corrugated drainhose and connector
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2 Versions:
Drain hose 5m with 1" F-NPT / G1,5" PPDrain hose 1,5m with 1" F-NPT / G1,5" PP
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HARE-SQ 10 series Photoresist
HARE-SQ-10
Photoresist
KemLab
HARE-SQ 10 series Photoresist
The HARE-SQ series is an epoxy based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications.
Film Thickness: 10 µm
Negative tone Photoresist
Superior cleanliness and optical clarity
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2 Versions:
HARE-SQ 10 series Photoresist (1000ml)HARE-SQ 10 series Photoresist (500ml)
Webshop
HARE-SQ 2 series Photoresist
HARE-SQ-2
Photoresist
KemLab
HARE-SQ 2 series Photoresist
The HARE-SQ series is an epoxy based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications.
Film Thickness: 2 µm
Negative tone Photoresist
Superior cleanliness and optical clarity
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2 Versions:
HARE-SQ 2 series Photoresist (1000ml)HARE-SQ 2 series Photoresist (500ml)
Webshop
HARE-SQ 25 series Photoresist
HARE-SQ-25
Photoresist
KemLab
HARE-SQ 25 series Photoresist
The HARE-SQ series is an epoxy based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications.
Film Thickness: 25 µm
Negative tone Photoresist
Superior cleanliness and optical clarity
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2 Versions:
HARE-SQ 25 series Photoresist (1000ml)HARE-SQ 25 series Photoresist (500ml)
Webshop
HARE-SQ 5 series Photoresist
HARE-SQ-5
Photoresist
KemLab
HARE-SQ 5 series Photoresist
The HARE-SQ series is an epoxy based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications.
Film Thickness: 5 µm
Negative tone Photoresist
Superior cleanliness and optical clarity
View product
2 Versions:
HARE-SQ 5 series Photoresist (1000ml)HARE-SQ 5 series Photoresist (500ml)
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