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HARE-SQ 2 series Photoresist

HARE-SQ-2

Photoresist

KemLab

The HARE-SQ series is an epoxy based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications.

Film Thickness: 2 µm

Negative tone Photoresist

Superior cleanliness and optical clarity

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2 Versions:

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HARE-SQ 5 series Photoresist

HARE-SQ-5

Photoresist

KemLab

The HARE-SQ series is an epoxy based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications.

Film Thickness: 5 µm

Negative tone Photoresist

Superior cleanliness and optical clarity

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2 Versions:

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HARE-SQ 10 series Photoresist

HARE-SQ-10

Photoresist

KemLab

The HARE-SQ series is an epoxy based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications.

Film Thickness: 10 µm

Negative tone Photoresist

Superior cleanliness and optical clarity

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2 Versions:

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HARE-SQ 25 series Photoresist

HARE-SQ-25

Photoresist

KemLab

The HARE-SQ series is an epoxy based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications.

Film Thickness: 25 µm

Negative tone Photoresist

Superior cleanliness and optical clarity

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2 Versions:

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HARE-SQ 50 series Photoresist

HARE-SQ-50

Photoresist

KemLab

The HARE-SQ series is an epoxy based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications.

Film Thickness: 50 µm

Negative tone Photoresist

Superior cleanliness and optical clarity

View product

2 Versions:

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SPS Europe B.V.
+31 341 360 590

SPS America Inc.
+1 503 502-5722

SPS Asia Technology Pte Ltd.
+65 911 30 172

sales@sps-polos.com

POLOS - About us

POLOS provides high-end equipment for the Semiconductor, Life Science, food, laboratories and pharmaceutical industries especially targeted to support; Universities, R&D institutes and small production facilities. Our portfolio consists of user-friendly and highly durable systems, mainly within the Photolithography and dispositioning process area. POLOS was established in 2003, with the start of our first product line; the Single Wafer Spin Coating Systems. As of today, over 4.000 units of these systems have been sold worldwide. Over the years, we have been fortunate to introduce many other new POLOS products. We carefully develop our equipment, based on long-term experience and user feedback, to support your process.