The MDA-400M-6 is a high-precision mask aligner tailored for research institutions seeking cutting-edge lithography capabilities. It enables the development and optimization of processes on small substrate samples or wafers up to 6” in diameter, combining accuracy with ease of use.
This manual-control system features a versatile UV light source (350–450 nm, standard 365 nm) with an intensity of 20–30 mW/cm² and a 6.25” × 6.25” beam providing 3% uniformity. An automatic exposure system ensures consistent results, while the Dual CCD zoom microscope with a 19” LCD monitor delivers magnification from 5× to 20× for precise sample inspection.
Available contact modes include Soft, Vacuum, Hard, and Proximity, with Vacuum and Hard contacts fully adjustable. Alignment accuracy is better than 1.0 micron, ensuring repeatable and reliable patterning.
Optional upgrades
- Anti-vibration table for enhanced stability
- UV intensity meter for precise exposure control
- UV-LED (365 nm) exposure module
