The FR-Scanner-AIO-Mic-XY200 is a fully integrated platform for automated, high-resolution characterization of single and multilayer patterned coatings on wafers. With 200 mm travel on both X and Y axes, the system ensures precise measurements while samples are securely held on a vacuum stage. Optical configurations cover a broad spectral range from 200 nm to 1700 nm, enabling versatile characterization across multiple materials.
Integrated design for accurate film analysis
This all-in-one system combines advanced optical, electronic, and mechanical modules to deliver precise characterization of complex surfaces, including micro-patterned and rough coatings. A vacuum chuck supports wafers up to 200 mm in diameter and is equipped with calibrated reflectance standards for reliable measurements. The optical module offers a spot size down to just a few microns, while the motorized XY stage provides rapid, repeatable travel with unmatched accuracy.
Key capabilities
- Real-time spectroscopic reflectance measurements
- Mapping of film thickness, optical properties, and non-uniformity
- High-quality imaging via integrated color camera
- Comprehensive statistical analysis of measured parameters
- Semi-automatic pattern alignment for periodic microstructures
- Unique software functions, including Click2Move, scale bar overlay, and more
Applications
- Universities and research laboratories
- Semiconductor coatings: oxides, nitrides, Si, photoresists
- MEMS devices and microstructures
- LEDs and VCSELs
- Data storage coatings
- Polymers, adhesives, and other functional films
- Custom applications upon request
Features
- Single-click automated analysis, no initial guess required
- Dynamic measurements for fast characterization
- Optical properties (n & k) and color assessment
- Pattern alignment and Click2Move for efficient mapping
- Configurable for off-line or integrated installations
- Free software updates
Principle of operation
The FR-Scanner-AIO-Mic-XY200 employs White Light Reflectance Spectroscopy (WLRS), measuring reflected light from films or multilayer stacks over a defined spectral range. Interference from film interfaces is analyzed to extract thickness, refractive index (n & k), and other optical properties for both free-standing and substrate-supported coatings.
