FR-Mic is a modular optical platform designed for precise, high-resolution characterization of coatings and thin films where measurement spot sizes down to a few micrometers are required. Ideal applications include micro-patterned surfaces, rough or uneven coatings, and other challenging samples. When paired with a computer-controlled XY stage, FR-Mic enables fully automated mapping of film thickness and optical properties across your sample, fast, accurate, and effortless.
Capabilities at a glance
- Real-time spectroscopic measurements
- Determination of film thickness, optical constants, and local non-uniformity
- Automated thickness and optical property mapping
- High-quality imaging with an integrated USB-connected color camera
FR-Mic allows localized measurement of reflectance, transmittance, absorbance, film thickness, and optical constants (n & k) across the UV, visible, and near-infrared spectral ranges with just a single click.
Flexible Integration
FR-Mic can be mounted directly on an FR-pRo system for compact operation or positioned separately for characterizing large surfaces or oversized samples.
Key features
- One-click analysis with no initial guess required
- Dynamic measurement of optical properties, including n & k and color
- Video capture for presentations or documentation
- Multiple installation options for offline or auxiliary analysis
- Free software updates
Applications
- Academic and research laboratories
- Semiconductor films (oxides, nitrides, silicon, resists, etc.)
- Life sciences and biomedical coatings
- MEMS devices and micro-patterned structures
- LED and VCSEL evaluation
- Data storage layers and anodization
- Hard and soft coatings on curved or irregular substrates
- Polymers, adhesives, parylene coatings, and balloon wall thickness measurements
- And more. Custom applications welcome
How it works
FR-Mic uses White Light Reflectance Spectroscopy (WLRS) to measure the amount of light reflected from a single-layer or multilayer coating across a broad spectral range. The reflected spectrum, shaped by interference from individual film interfaces, is analyzed to extract precise film thickness, optical constants (n & k), and other key material parameters. The system works on both free-standing films and films supported on transparent, partially reflective, or fully reflective substrates.
