+31 341 360 590info@sps-polos.com
POLOS

Compose your tabletop spin coater

Compose your tabletop spin coater

Files

Product description

Our next-generation POLOS® SPINx-series spin processor features upgraded design elements for enhanced process stability and user flexibility. Engineered for high-precision coating and repeatability, this system is available in Natural Polypropylene (NPP) or chemically resistant PTFE configurations. Choose between the Standard or Advanced model to suit your lab’s workflow.

Designed to support a wide variety of substrates, these systems accommodate wafers from 150 mm in diameter or 100 x 100 mm square samples up to 300 mm in diameter or 200 x 200 mm square samples, making it a versatile choice for both research and production settings.

These spin coaters are suitable for:

  • Coating
  • Cleaning
  • Rinse/Dry
  • Developing
  • Etching
  • PDMI and other processes

 

Modular by design

The cleverly engineered outer casing and drain system support seamless in-field conversion between a table-top and in-deck installation. A modular layout offers futureproofing through a wide array of accessories, making upgrades and integration with dispensing tools straightforward.

Automation-ready

Integration into robotic systems is simplified with the SPINx-series thanks to customizable motor homing positions, allowing for precise alignment during automated wafer handling.
For added convenience, the raised vacuum chuck sits above the bowl’s edge, facilitating safe, efficient access to substrates using tweezers, vacuum wands, or robotic end-effectors. This layout supports automation and minimizes handling errors.

Built-in liquid filter protection

To shield key internal components from contamination, the SPINx-series features a dedicated liquid filter trap. Positioned between the chamber and vacuum lines, it collects any accidental fluid ingress, protecting the vacuum sensor, drive system, and ServoBL Controller. Collected liquids are stored safely in a removable jar, visible through a side housing window for quick maintenance checks. We recommend inspecting and emptying the jar regularly as part of your preventative maintenance routine.

Specifications hardware SPINx-series: 

  • Process chamber Material: Natural polypropylene (NPP) or PTFE
  • Max. substrate diameter: From 6” (150 mm) wafers up to 12" (300 mm) wafers 
  • Liquid filter trap
  • Automatic lid, also controllable via foot pedal (advanced version)
  • Programmable motor homing position
  • Center injection holder for syringe or dispense nozzle
  • Lid lock and vacuum sensor for user safety
  • Large (detachable) touchscreen display
  • USB-port to store recipes on USB-drive and for software updates specifications drive-unit
  • Indirect brushless drive unit - up to 12.000 RPM
  • High acceleration and accuracy: 1 - 30.000 RPM
  • Clockwise/counter clockwise rotation and puddle mode
  • Unique design to switch between desktop and in-deck model

Complimentary chuck and adapter: 

Choose from a wide variety of chucks and adapters

POLOS

Compose your tabletop spin coater

Unique outer shell and drain design to switch between table-top and in-deck model in-field
 Easy chamber access
Motor homing positioning
 Lid lock and vacuum sensor for user safety
 Compose your SPINx-series spin processor easily down below!


Do you expect to use strong chemicals or acids in your POLOS® spin processor? As example; HF, HN03, KOH, Etc. See our chemical compatibility list

No - You will need standard NPP
Yes - You will need PTFE for chemical resistance

How would you like to dispense your media? Our recommendation for manual dispensing: our Syringe Holder Starter Kit. For semi-automatic and automatic dispensing we have different options by application.


How many media would you like to use?

1 medium (single syringe dispense)
3 media (multi syringe dispense)

How many configurable dispense lines would you like to add to your POLOS® spin processor?

1 dispense line
2 dispense lines
3 dispense lines

What type of nozzle would you like to use?

  • Fan spray nozzles are primarily used for coating and developing and create a mist-like dispense. 
  • Jet spray nozzles are primarily used for direct dispense during etching, rinsing and drying applications. 
  • EBR nozzles are used for Edge Bead Removal applications where a user removes any build-up photoresist at the edge of the wafer.

Choose your preferred POLOS® dispense pump.

  • Our presurized syringe pump allows better repeatability during syringe based applications, connect the pressure generator directly to your syringe and select the desired pressure to start dispensing. 
  • Our dosing pump can be screwed directly to the top of your resist bottle and allows for precise dispensing of photoresist, by selecting the volume and dispense time you can fine-tune your photoresist dispense step. 
  • Our POLOS® peristaltic pump is the go to pump for allmost all applications, the option to replace/swap the dispense line will allow you to use a silicon tube for resist applications while a Pharmed® tube version is also available for more aggresive developer, solvents or acids. To check compatibility, please reach out to one of our sales representatives.

Choose your preferred POLOS® dispense solution

  • Our POLOS® dispense vessel supports dispensing of the most aggressive chemicals and acids, you can pour your fluid directly into the thick-walled PTFE vessel or load a bottle. By regulating the pressure, the dispense volume can de defined. A spinner-controlled suck back valve will allow you to open or close the dispense line during your process step. 
  • Our POLOS® peristaltic pump is the go-to pump for almost all applications, the option to replace/swap the dispense line will allow you to use a silicon tube for resist applications while a Pharmed® tube version is also available for more aggressive developer, solvents, or acids. To check compatibility, please reach out to one of our sales representatives.

What type of nozzle would you like to use? 

  • Fan spray nozzles are primarily used for coating and developing and create a mist-like dispense. 
  • Jet spray nozzles are primarily used for direct dispense during etching, rinsing and drying applications. 
  • EBR nozzles are used for Edge Bead Removal applications where a user removes any build-up photoresist at the edge of the wafer.

Choose your preferred POLOS® dispense pump.

  • Our presurized syringe pump allows better repeatability during syringe based applications, connect the pressure generator directly to your syringe and select the desired pressure to start dispensing. 
  • Our dosing pump can be screwed directly to the top of your resist bottle and allows for precise dispensing of photoresist, by selecting the volume and dispense time you can fine-tune your photoresist dispense step. 
  • Our POLOS® peristaltic pump is the go to pump for allmost all applications, the option to replace/swap the dispense line will allow you to use a silicon tube for resist applications while a Pharmed® tube version is also available for more aggresive developer, solvents or acids. To check compatibility, please reach out to one of our sales representatives.

Choose your preferred POLOS® dispense solution

  • Our POLOS® dispense vessel supports dispensing of the most aggressive chemicals and acids, you can pour your fluid directly into the thick-walled PTFE vessel or load a bottle. By regulating the pressure, the dispense volume can de defined. A spinner-controlled suck back valve will allow you to open or close the dispense line during your process step. 
  • Our POLOS® peristaltic pump is the go-to pump for almost all applications, the option to replace/swap the dispense line will allow you to use a silicon tube for resist applications while a Pharmed® tube version is also available for more aggressive developer, solvents, or acids. To check compatibility, please reach out to one of our sales representatives.

What type of nozzle would you like to use? 

  • Fan spray nozzles are primarily used for coating and developing and create a mist-like dispense. 
  • Jet spray nozzles are primarily used for direct dispense during etching, rinsing and drying applications. 
  • EBR nozzles are used for Edge Bead Removal applications where a user removes any build-up photoresist at the edge of the wafer.

Choose your preferred POLOS® dispense pump.

  • Our presurized syringe pump allows better repeatability during syringe based applications, connect the pressure generator directly to your syringe and select the desired pressure to start dispensing. 
  • Our dosing pump can be screwed directly to the top of your resist bottle and allows for precise dispensing of photoresist, by selecting the volume and dispense time you can fine-tune your photoresist dispense step. 
  • Our POLOS® peristaltic pump is the go to pump for allmost all applications, the option to replace/swap the dispense line will allow you to use a silicon tube for resist applications while a Pharmed® tube version is also available for more aggresive developer, solvents or acids. To check compatibility, please reach out to one of our sales representatives.

Choose your preferred POLOS® dispense solution

  • Our POLOS® dispense vessel supports dispensing of the most aggressive chemicals and acids, you can pour your fluid directly into the thick-walled PTFE vessel or load a bottle. By regulating the pressure, the dispense volume can de defined. A spinner-controlled suck back valve will allow you to open or close the dispense line during your process step. 
  • Our POLOS® peristaltic pump is the go-to pump for almost all applications, the option to replace/swap the dispense line will allow you to use a silicon tube for resist applications while a Pharmed® tube version is also available for more aggressive developer, solvents, or acids. To check compatibility, please reach out to one of our sales representatives.

Vacuum at point of use - add our POLOS® vacuum pump (230V and 110V available).


Perfectly fitting syringes - add our POLOS® syringe holder starter kit to your setup

Yes
No

Drain to your in-house (drain)facilities - add our POLOS® drain hose.

Yes
No

Improve your photoresist coating uniformity - add our POLOS® static barrier plate.

Yes
No

Keep your spinner clean at all times and collect valuable media - add our POLOS® antistatic PET liner set (20 pcs).

Yes
No

Align your wafers and square substrates with ease - add our POLOS® centering aid.

Yes
No

Summary

Quoteform

Please fill in the quoteform to send your request.
Share configuration
Reset configuration
Share configuration

Send via email:

Copy the link:

The link has been copied!
Your configuration will be deleted in 6 months

Specifications

Brand
POLOS
Product Number
Configurator-SPINx-series2
Material
Natural Polypropylene (NPP) or PTFE
Substrate size
6" (150 mm) Up to 12" (300 mm)
Model
Tabletop