Hotplates

Boost efficiency in your lab with the POLOS® Hotplate

The table-top POLOS® Hotplate is the ideal solution for research and development or pilot-line environments where precision and control are critical. Designed for maximum flexibility, it supports a wide range of applications, including soft bake, hard bake, and the curing of photoresist, epoxy, and other temperature-sensitive materials.

With a sleek soft-close lid and intuitive design, this hotplate ensures effortless, single-handed operation while maintaining a safe, cool exterior. The dual-layer construction enhances thermal efficiency, and the user-friendly interface allows you to store and run up to 20 custom programs with ease.

For even more demanding applications, the Advanced Version comes packed with enhanced features—giving you greater control and consistency when it matters most.

 

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Discover your hotplate solutions

 

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Why choose the POLOS® Hotplate?

  • Flexible substrate support – Compatible with 200 mm and 350 mm wafers
  • Safe, simple handling – Soft-close lid enables easy, one-handed operation
  • Consistent results – Uniform temperature control within ±1°C
  • Smart process control – Program and store up to 20 custom bake recipes
  • Time management – Countdown timer from 1 to 999 seconds
  • Cool exterior – 2-layer lid design keeps outer surface safe to touch

 

 

 

 

 

 

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Your information
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Advanced version includes
even more:

  • Nitrogen Purge – Ensure inert bake environments for sensitive materials
  • Lifting & Proximity Pins – Precise substrate handling for optimal process control
  • Vacuum Bake Capability – For enhanced material performance and reduced defects

 

 

Easily convertible into an
indeck model

Using our specially designed indeck bracket and display bracket, you can easily convert
the POLOS® hotplate into an indeck solution.

 

 

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Engineered for accuracy. Designed for ease.

Elevate your lab’s baking capabilities with the POLOS® Hotplate. Get in touch with us today to set-up your ideal hotplate solution.