The POLOS® Hotplate 200 is a versatile, table-top hotplate engineered for accurate thermal processing in research labs and pilot-scale production. Perfect for soft bake, hard bake, or curing routines, it handles a wide range of materials including photoresist, epoxy, and other temperature-sensitive compounds. A soft-close lid ensures safe and controlled handling during operation.
Reliable and flexible performance
Designed to support wafers and substrates up to 200 mm, the Hotplate 200 provides uniform, stable heating for both standard and advanced thermal cycles. Its compact footprint makes it an ideal solution for labs seeking consistent, high-quality results without the space requirements of larger systems.
Advanced functionality available
The advanced model includes enhanced features for specialized applications:
- N₂ connection for inert atmosphere baking
- Lifting pins for easy substrate handling
- Vacuum baking capability
- Proximity pins for controlled, contactless processing
Seamless in-deck integration
With the optional in-deck and display bracket kit, the POLOS® Hotplate 200 can easily transition from a table-top unit to an in-deck installation, offering full flexibility as lab requirements evolve.
