The POLOS® SPIN300x is a high-capacity spin processor engineered for exceptional process consistency, coating uniformity, and operational control. Designed exclusively as an Advanced configuration, this system builds on the proven SPINx platform and is constructed from Natural Polypropylene (NPP), with an optional PTFE version available for chemically aggressive applications. This Advanced model is standardly equipped with an auto-closing lid and optional dispense vessel, optional linear dispense arm and optional backside rinse feature.
Optimized for demanding R&D and production environments, the SPIN300x supports round wafers up to 300 mm in diameter as well as square substrates up to 200 × 200 mm, making it an ideal solution for large-format processing and scalable workflows.
Flexible substrate processing
The SPIN300x is suitable for a wide range of wet processing applications, including:
- Coating
- Cleaning
- Rinsing and drying
- Developing
- Etching
- PDMI and related processes
Modular design with in-deck compatibility
The system’s distinctive outer housing and integrated drain architecture enable straightforward conversion between tabletop operation and in-deck installation. Its modular construction supports a broad selection of accessories, allowing users to simplify dispensing, improve ergonomics, and futureproof the system as process requirements evolve.
Automation-ready by design
As part of the SPINx series, the SPIN300x is built with automation in mind. Programmable motor homing positions allow precise alignment with robotic wafer-handling systems, supporting smooth integration into automated or semi-automated environments.
Optimized chamber accessibility
The raised vacuum chuck sits above the bowl rim, providing unobstructed access to the substrate. This design enables safe, efficient handling using tweezers, vacuum wands, or robotic end-effectors, reducing handling risk and supporting reliable automated loading and unloading.
Automatic lid operation
For improved usability and safety, the lid can be opened and closed automatically via the touchscreen interface or an optional foot pedal, ideal for glovebox or hands-free operation. The lid can also be programmed to open automatically at the end of a recipe, streamlining workflows and improving throughput.
Integrated liquid filter protection
To protect critical internal components, the SPIN300x includes a dedicated liquid filter trap positioned between the process chamber and vacuum lines. This system captures any accidental fluid ingress before it can reach the drive unit, vacuum sensor, vacuum valve, or ServoBL Controller. Collected liquids are stored in a removable container that is visible through a side housing window, allowing quick inspection as part of routine preventative maintenance.
SPIN300x hardware specifications
Process chamber
- Material options: Natural Polypropylene (NPP) or PTFE (optional)
- Substrate capacity: Up to 12" (300 mm) wafers or 8" × 8" (200 mm) samples
- Integrated liquid filter trap
- Automatic lid with optional foot-pedal control
- Programmable motor homing position
- Center-mounted syringe or dispense nozzle holder
- Safety features: lid lock and vacuum sensor
- Large detachable touchscreen display
- USB port for recipe storage and software updates
Drive unit
- Clockwise and counterclockwise rotation with puddle mode
- Convertible design for seamless tabletop or in-deck installation




