Our latest-generation 200 mm spin processor, the POLOS® SPIN200x, is engineered to deliver exceptional coating uniformity, process stability, and operator control. Built for demanding R&D and production environments, the system is offered in Natural Polypropylene (NPP) or chemically robust PTFE. Choose the Standard configuration or step up to the Advanced model for more advanced features.
Versatile substrate handling
Designed to support a broad variety of processes, the SPIN200x spin coaters accommodate round wafers up to 200 mm in diameter as well as square substrates up to 150 × 150 mm. This flexibility makes it suitable for laboratories handling multiple materials and sample formats.
Suitable for processes such as:
- Coating
- Cleaning
- Rinsing and drying
- Developing
- Etching
- PDMI and related applications
Modular configuration & easy integration
Its modular construction allows seamless use as either a tabletop unit or an in-deck system. The optimized chassis, intelligent drain layout, and wide selection of optional accessories ensure the SPIN200x can evolve with your workflow, whether you’re expanding capabilities or integrating advanced dispense solutions.
Built for automation
Automation readiness is at the core of the SPINx platform. The SPIN200x features adjustable motor homing positions to align precisely with robotic wafer-handling systems. The elevated vacuum chuck sits above the bowl rim, giving safe and efficient access for tweezers, vacuum tools, and robotic end-effectors. This design reduces the risk of handling damage and supports smooth automated loading and unloading.
Liquid-filter safeguarding
An internal liquid filter trap provides critical protection by intercepting any process fluids that may enter the vacuum path. This prevents contamination of the drive module, ServoBL Controller, and vacuum sensor. The collection jar is removable and visible from the outside, allowing quick inspection and straightforward maintenance, an important step in any preventative care routine.
SPIN200x hardware specifications
Process chamber
- Material options: Natural polypropylene (NPP)
- Substrate capacity: Up to 8" (200 mm) wafers or 6" × 6" (150 mm) samples
- Integrated liquid filter trap
- Automatic lid with optional foot-pedal operation (Advanced model)
- Programmable motor homing
- Center-mounted syringe or nozzle holder
- Safety features: lid lock and vacuum sensor
- Large detachable touchscreen control panel
- USB port for recipe management and software updates
Drive unit
- Indirect brushless motor, maximum speed 12,000 RPM
- High-precision operation from 1 - 30,000 RPM
- Clockwise/counter-clockwise rotation and puddle mode
- Convertible design for easy transition between tabletop and in-deck use
Included chuck:
- Vacuum chuck for 4 - 8-inch wafers
