The POLOS® SPIN150x brings a new level of control and consistency to your coating processes. Its refined architecture delivers exceptional process stability, while giving users the freedom to tailor the system to their application needs. Available in durable Natural Polypropylene (NPP) or chemically inert PTFE, the SPIN150x can be configured as a Standard or Advanced model.
Supporting a broad range of substrates, the SPIN150x handles wafers up to 150 mm, as well as samples up to 100 × 100 mm. This flexibility makes it an excellent choice for both R&D environments and small-scale production workflows.
Ideal for processes such as:
- Coating
- Cleaning
- Rinse & Dry
- Developing
- Etching
- PDMI and related applications
Designed for modularity
The SPIN150x platform features a smart outer housing and drainage design, allowing quick conversion between a tabletop unit and in-deck installation. Its modular construction ensures long-term adaptability, offering an extensive selection of add-ons and accessories to simplify upgrades and integration with dispensing solutions.
Ready for automation
The SPINx-series architecture ensures smooth integration into automated handling systems. Adjustable motor homing positions enable precise alignment for robotic loading. The elevated vacuum chuck sits above the bowl edge, making it easy to place and retrieve substrates using tweezers, vacuum tools, or robotic grippers, all while reducing the risk of handling errors.
Integrated liquid-filter protection
To safeguard internal components, the SPIN150x includes a built-in liquid filter trap located between the process chamber and the vacuum system. This protective feature captures any accidental fluid ingress before it can reach the vacuum sensor, drive mechanics, or ServoBL Controller. A transparent side window provides quick visibility of the removable collection jar, enabling simple and proactive maintenance.
Hardware specifications SPIN150x:
Process chamber
- Material options: Natural Polypropylene (NPP) or PTFE
- Substrate capacity: Up to 6" (150 mm) wafers or 4" × 4" (100 mm) substrates
- Integrated liquid filter trap
- Automatic lid (Advanced model), optional foot-pedal control
- Programmable motor homing
- Center injection mount for syringe or dispense nozzle
- Safety features: lid lock and vacuum sensor
- Large detachable touchscreen interface
- USB port for recipe storage and software updates
Specifications drive-unit
- Brushless indirect drive, speeds up to 12,000 RPM
- Precision acceleration and speed control from 1–30,000 RPM
- Rotation modes: CW, CCW, and puddle mode
- Unique convertible design for tabletop or in-deck configuration
Included chuck & adapter
- Vacuum chuck for 4 - 6-inch wafers
- Fragment adapter for samples ≥ 10 mm
