The POLOS® PC330 is a compact, tabletop photoresist spray coating system developed for applications that demand uniform coverage on complex and structured substrates. Using advanced ultrasonic spray technology, the system delivers highly consistent photoresist deposition on wafers, MEMS, masks, and other substrates with challenging topographies, where traditional spin coating reaches its limits.
Efficient coating with minimal material waste
By generating ultra-fine droplets through ultrasonic atomization, the PC330 achieves exceptionally high deposition efficiency. With material utilization exceeding 95%, photoresist consumption is significantly reduced compared to conventional coating methods. This not only lowers operating costs but also improves process repeatability and overall throughput.
Compact, flexible, and easy to operate
Designed in close collaboration with end users, the PC330 combines a small footprint with intuitive software controls. A wide selection of ultrasonic nozzles and optional accessories allows the system to be configured precisely for each application, ensuring optimal performance across different materials, coating areas, and thickness requirements.
Versatile substrate and process support
The PC330 supports wafers up to 300 mm (12") and produces photoresist layers typically ranging from 1 to 100 microns, depending on the material and process settings. An adjustable, multi-channel vacuum heating plate ensures stable and uniform processing for different wafer sizes, making the system suitable for both R&D and production environments.
Key features
- Compact benchtop design
- Superior coating coverage on microstructured surfaces compared to spin coating
- Ultrasonic nozzle technology for high-precision nanoparticle deposition
- Material utilization efficiency greater than 95%
- Compatibility with all POLOS® by Siansonic® ultrasonic nozzles
- Spray width: 1 - 100 mm
- Flow rate: 0.001 - 50 ml/min
- Maximum spray area: 300 × 300 mm (12")
- Coating uniformity exceeding 95%
- Supported liquid viscosity: <30 cps
- Coating thickness range: 1 - 100 microns (material dependent)
- XYZ servo-driven motion system
- High-accuracy syringe pump
- Integrated exhaust system
- Laser-assisted nozzle alignment
- Switchable multi-channel vacuum heating plate for 4”, 6”, 8”, and 12” wafers
