The POLOS® PC320 benchtop photoresist spray coating system delivers uniform, high-precision coatings for wafers, MEMS, masks, and other substrates with complex surface topographies. Utilizing advanced ultrasonic spray technology, the system ensures consistent deposition while maximizing material efficiency, making it an ideal solution for high-performance R&D and production environments.
Efficient coating with minimal waste
Our ultrasonic spray approach allows material usage ratios exceeding 95%, significantly reducing photoresist consumption compared to conventional coating methods. This precision reduces costs while improving reproducibility and process efficiency, enabling labs to achieve reliable results with minimal waste.
User-friendly and flexible
Designed with the user in mind, the PC320 features intuitive software controls and a modular design that supports a wide range of ultrasonic nozzles and optional accessories. This flexibility lets users tailor the system to their specific process requirements, ensuring optimal performance across diverse applications.
Versatile substrate support
The system accommodates wafers up to 150 mm (6") and delivers coating thicknesses from 1 to 100 microns, depending on the material. An adjustable vacuum heating plate ensures uniform results for wafers of different sizes and supports precise control over process parameters.
Key features
- Compact benchtop system for easy integration
- Superior coverage for microstructured surfaces and controllable coating area
- Ultrasonic nozzle for high-precision nanoparticle coating, material efficiency >95%
- Compatible with all POLOS® by Siansonic® nozzle series; spray width 1 - 100 mm, flow rate 0.001 - 50 ml/min
- Maximum spray area: 150 mm x 150 mm (6")
- Coating uniformity >95%
- Liquid viscosity <30 cps
- Coating thickness: 1 - 100 microns (material-dependent)
- XYZ servo motion system with precision syringe pump
- Exhaust system for safe operation
- Laser-assisted nozzle positioning
The POLOS® PC320 combines precision, efficiency, and flexibility in a compact tabletop design, enabling labs to achieve high-quality, repeatable photoresist coatings while optimizing material use.
