The MDA-600S is a versatile mask aligner widely used in MEMS, LED, and semiconductor research. Offering exceptional alignment accuracy and resolution, it is an ideal and cost-effective solution for universities, research centers, and R&D labs. Capable of processing both thin, high-resolution photoresists and thick, high-aspect-ratio layers up to approximately 170 µm, the MDA-600S meets a broad range of application needs without requiring additional optics.
This semi-automatic, benchtop system occupies just one square meter of cleanroom space (1256 × 1151 × 1600 mm W × D × H), making it a compact alternative for pilot production or laboratory research. The system features auto-exposure, leveling, and Z-axis stage motion, while wafer loading, unloading, and alignment are performed manually.
The alignment module includes precise micrometer control for X, Y, and Z axes, delivering ±0.5 µm alignment accuracy. With its combination of flexibility, performance, and affordability, the MDA-600S is an excellent entry-level solution for mask alignment and UV exposure applications.
Optional upgrades
- Back-side alignment module (CCD camera)
- CCD-based optical BSA
- Nanoimprint kit
