The POLOS® Hotplate 350 is a high-performance, table-top hotplate designed for accurate thermal processing of larger substrates in research and pilot-scale production. Ideal for soft bake, hard bake, and curing of photoresist, epoxy, and other temperature-sensitive materials, it provides uniform, repeatable heating and a soft-close lid for safe, controlled operation.
Engineered for larger substrates
Capable of handling wafers and substrates up to 300 mm, the Hotplate 350 maintains precise temperature control across larger surfaces, delivering the same reliability and consistency as smaller models. It’s the perfect solution for labs working with bigger materials without sacrificing thermal precision.
Advanced features standard
The advanced Hotplate 350 comes fully equipped, including:
- N₂ connection for inert atmosphere baking
- Lifting pins for easy substrate manipulation
- Vacuum bake capability
- Proximity pins for non-contact processing
Flexible in-deck integration
With the optional in-deck display bracket, the Hotplate 350 can be quickly converted from a table-top unit to an in-deck installation, providing adaptability as your laboratory workflow evolves from research to semi-automated processes.
