KemLab

HARE-SQ 25 series Photoresist

HARE-SQ 25 series Photoresist

Product description

HARE-SQ™ (High Aspect Ratio Epoxy / Superior Quality) is a negative-tone, epoxy-based photoresist developed for advanced microfabrication applications such as polymer MEMS, microfluidic devices, micromachining, and other microelectronic structures. Its excellent chemical stability, mechanical strength, and thermal durability make it particularly well-suited for permanent features that remain part of the final device.

Optimized for thick-film processing, HARE-SQ™ supports layer thicknesses from 2 to over 100 µm and delivers reliable performance where high aspect ratios and long-term stability are required. The resist is sensitive to near-UV, i-line, and broadband exposure sources and is formulated using high-purity epoxy systems specifically engineered for the electronics industry.

Compared with conventional epoxy photoresists, HARE-SQ™ offers improved optical transparency, reduced particle content, fewer entrapped micro-bubbles, and excellent batch-to-batch consistency. These characteristics enable lower exposure energy, improved pattern fidelity, and highly reproducible results.

HARE-SQ™ demonstrates strong adhesion to a wide range of substrates (including silicon, gold, aluminum, chromium, and copper) when proper surface preparation and dehydration are applied. In addition to traditional spin coating, the material is compatible with alternative deposition methods such as spray coating, slot-die coating, and other additive processes.

Key capabilities

  • Film thickness range: 2 to 100+ µm
  • Supports single or double-coat processes
  • High optical clarity with low opacity
  • Reduced particle levels and minimal micro-bubble formation
  • Consistent surface energy after curing
  • Excellent process repeatability
  • Near-UV exposure range: 300–400 nm
  • Development via immersion, puddle, or spray-puddle methods
  • Optional hard bake for enhanced cross-linking in permanent applications

HARE-SQ™ delivers performance comparable to SU-8™ and is fully compatible with standard SU-8 processing workflows, making it easy to integrate into existing fabrication lines.

Handling & disposal
HARE-SQ™ contains combustible components and should be stored and handled away from ignition sources, heat, sparks, and open flames. The material is compatible with standard photoresist waste streams; however, disposal must always comply with applicable local and regional regulations and remains the responsibility of the user.

KemLab

HARE-SQ 25 series Photoresist

Choose your version:
Excellent chemical, mechanical and thermal resistance
Suitable for permanent applications
Competes with SU-8™
Double-coat process available

Specifications

Brand
KemLab
Product Number
HARE-SQ-25
Material
N/A
Substrate size
Film Thickness: 25 µm
Model
Negative tone Photoresist
System type
Superior cleanliness and optical clarity
Status
Request information

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