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POLOS

FR-Ultra NIR-N3

Product description

FR-Ultra is a unit dedicated for the fast, accurate and non-destructive measurement of thick and ultra-thick semiconductor and transparent layers.

FR-Ultra is a dedicated tool for the accurate measurement of thick and ultra-thick layers from semiconducting and/or dielectric materials. Thanks to its advanced optics, FR-Ultra can measure either smooth or rough films & substrates of very high thickness.

Typical applications include:

  • Thickness measurement of thick glasses (up to 2 mm in thickness either clear or haze)
  • Thickness measurement of wafers (e.g. Single or Double Side Polished wafers up to 12 inch in diameter).
  • FR-Ultra can be easily integrated with Cartesian and Polar stages for thickness mapping over large areas.

Features

  • Single-click analysis (no need for initial guess)
  • Dynamic measurements
  • 800+ materials
  • Multiple installations for offline analysis
  • Free of-charge Software update

Applications

  • Univ. & Research labs
  • Semiconductors
  • Polymer & Resist characterization
  • Dielectric characterizations
  • Hardcoat, Anodization,
  • And many more… (contact us with your requirements)
POLOS

FR-Ultra NIR-N3

Choose your version:
Fast, accurate and non-destructive measurement of thick and ultra-thick semiconductor and transparent layers
Advanced optics
Single-click analysis
800+ materials

Specifications

Brand
POLOS
Product Number
FR-Ultra-NIR-N3
Version of
Thickness range
10 μm – 2 mm
Spectral range
1280 nm - 1350 nm
Light Source MTBF
SLED (internal), >150000h (MTBF)
System type
Table-top
Status
Request information