The AT650T is a compact, table-top thermal ALD tool designed for high-precision thin-film deposition with the added benefit of in-field plasma upgradeability. Its streamlined chamber and small volume enable fast cycling and high-exposure processing, making deep penetration and uniform coatings achievable even on complex substrates.
Compact and cleanroom-ready
With a footprint of just 15″ × 15″, the AT650T fits easily on any benchtop while remaining fully compatible with cleanroom environments. Its fast cycle times and high exposure capability allow for deep, uniform processing with minimal maintenance and low operating costs, making it an affordable solution for labs and research facilities.
Key features
- Small footprint (15″ × 15″) desktop thermal ALD, cleanroom compatible
- Field-upgradable to plasma ALD for expanded process flexibility
- Streamlined aluminum chamber with minimal volume for fast cycling and high exposure
- Substrate temperature range: RT – 400 °C ±1 °C
- Precursor temperatures: RT – 185 °C ±2 °C (with optional heating jackets)
- Heated sample holder and warm-walled chamber for precise thermal control
- Accommodates substrates up to 6″ diameter (customizable chucks available)
- 3 organometallic precursor lines (heatable to 185 °C with N₂ assist), 1 at RT (upgradeable to 185 °C), and up to 4 oxidant/reductant sources
- High-temperature fast-pulsing ALD valves with integrated ultrafast MFC for inert gas purging
- High-exposure static processing mode for enhanced film conformality
- Integrated matching network for plasma-ready operation
- Comprehensive hardware and software interlocks for safe multi-user operation
Optional enhancements
- Plasma upgrade for advanced ALD processing
- Customized chucks or platens for specific substrates
- ATOzone generator for specialized films (Pt, Ir, SiO₂, MoO₂, high-quality Al₂O₃ <60 °C, HfO₂)
- Quartz Crystal Microbalance (QCM) for real-time deposition monitoring
- Additional counter-reactant lines with MFC control (up to 2 extra)
- Optional 4th heated precursor line (up to 185 °C)
