The AT200M is the most compact desktop ALD tool available, designed for ease of operation and installation. Its small footprint makes it ideal for educational labs, metrology, and research environments where space and cost are critical.
Despite its compact size, the AT200M uses semiconductor-grade components, metal-sealed lines, and a robust PLC-driven interface, delivering fast cycle times, high-quality single-component thin films, and consistent, repeatable results, all while ensuring easy maintenance and safe operation.
Key features
- Compact desktop ALD system: W 14" × D 15" × H 14.5" (35.5 × 38.1 × 36.8 cm)
- Powder coating capability (up to ~10 cm³)
- Accommodates samples up to 2" × 2" × 3" or two 2" wafers (customizable chucks available)
- 2 precursor ports standard; 4 ports optional with heat-traced lines to 150°C (HT kit extends to 180°C)
- Optional hollow cathode plasma upgrade
- Vented precursor enclosure for safety
- Fast-pulsing, high-temperature-compatible ALD valves with integrated inert gas purge
- Stainless steel chamber, temperature up to 300°C
- Static processing mode for high-exposure applications
- 5" touchscreen with integrated PLC control
- Lifetime software updates included
- 1-year warranty (parts and labor)
Optional upgrades
- Vacuum pump
- 4-port manifold
- Ozone generator (AT-O3)
- Battle heaters / QCM
- Remote PC control
- ALD precursors
- Glovebox integration
- High-temperature kit (precursors up to 180°C)
- Bubbler system
- Powder coater
- Hollow cathode plasma
