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Photoresist Type
Negative tone Photoresist
Key Benefit
Superior cleanliness and optical clarity

Photoresist

At POLOS® we offer an epoxy based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications. It is designed for use in thick film applications of 2 to 100 μm, and is ideal for use in permanent applications in which the photoresist remains within the finished device.

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Photoresist
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HARE-SQ 10 series Photoresist
HARE-SQ-10
Photoresist
KemLab
HARE-SQ 10 series Photoresist 516.1739 Webshop » Photoresist » Photoresist
The HARE-SQ series is an epoxy based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications.
Film Thickness: 10 µm
Negative tone Photoresist
Superior cleanliness and optical clarity
View product
2 Versions:
HARE-SQ 10 series Photoresist (1000ml) 590.7825 Webshop » Photoresist » PhotoresistHARE-SQ 10 series Photoresist (500ml) 516.1739 Webshop » Photoresist » Photoresist
Webshop
HARE-SQ 2 series Photoresist
HARE-SQ-2
Photoresist
KemLab
HARE-SQ 2 series Photoresist 495.9548 Webshop » Photoresist » Photoresist
The HARE-SQ series is an epoxy based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications.
Film Thickness: 2 µm
Negative tone Photoresist
Superior cleanliness and optical clarity
View product
2 Versions:
HARE-SQ 2 series Photoresist (1000ml) 561.2343 Webshop » Photoresist » PhotoresistHARE-SQ 2 series Photoresist (500ml) 495.9548 Webshop » Photoresist » Photoresist
Webshop
HARE-SQ 25 series Photoresist
HARE-SQ-25
Photoresist
KemLab
HARE-SQ 25 series Photoresist 527.0276 Webshop » Photoresist » Photoresist
The HARE-SQ series is an epoxy based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications.
Film Thickness: 25 µm
Negative tone Photoresist
Superior cleanliness and optical clarity
View product
2 Versions:
HARE-SQ 25 series Photoresist (1000ml) 607.8798 Webshop » Photoresist » PhotoresistHARE-SQ 25 series Photoresist (500ml) 527.0276 Webshop » Photoresist » Photoresist
Webshop
HARE-SQ 5 series Photoresist
HARE-SQ-5
Photoresist
KemLab
HARE-SQ 5 series Photoresist 506.8327 Webshop » Photoresist » Photoresist
The HARE-SQ series is an epoxy based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications.
Film Thickness: 5 µm
Negative tone Photoresist
Superior cleanliness and optical clarity
View product
2 Versions:
HARE-SQ 5 series Photoresist (1000ml) 576.7828 Webshop » Photoresist » PhotoresistHARE-SQ 5 series Photoresist (500ml) 506.8327 Webshop » Photoresist » Photoresist
Webshop
HARE-SQ 50 series Photoresist
HARE-SQ-50
Photoresist
KemLab
HARE-SQ 50 series Photoresist 537.9176 Webshop » Photoresist » Photoresist
The HARE-SQ series is an epoxy based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications.
Film Thickness: 50 µm
Negative tone Photoresist
Superior cleanliness and optical clarity
View product
2 Versions:
HARE-SQ 50 series Photoresist (1000ml) 621.8795 Webshop » Photoresist » PhotoresistHARE-SQ 50 series Photoresist (500ml) 537.9176 Webshop » Photoresist » Photoresist