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Photoresist
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Photoresist Type
Negative tone Photoresist
Key Benefit
Superior cleanliness and optical clarity
Photoresist
At POLOS® we offer an epoxy based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications. It is designed for use in thick film applications of 2 to 100 μm, and is ideal for use in permanent applications in which the photoresist remains within the finished device.
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Photoresist
Photoresist
Refine
Category
All photoresist
Photoresist
(5)Material
N/A
Film Thickness
10 µm
2 µm
25 µm
5 µm
50 µm
Photoresist Type
Negative tone Photoresist
Key Benefit
Superior cleanliness and optical clarity
Webshop
HARE-SQ-10
Photoresist
KemLab
The HARE-SQ series is an epoxy based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications.
Film Thickness: 10 µm
Negative tone Photoresist
Superior cleanliness and optical clarity
Webshop
HARE-SQ-2
Photoresist
KemLab
The HARE-SQ series is an epoxy based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications.
Film Thickness: 2 µm
Negative tone Photoresist
Superior cleanliness and optical clarity
Webshop
HARE-SQ-25
Photoresist
KemLab
The HARE-SQ series is an epoxy based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications.
Film Thickness: 25 µm
Negative tone Photoresist
Superior cleanliness and optical clarity
Webshop
HARE-SQ-5
Photoresist
KemLab
The HARE-SQ series is an epoxy based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications.
Film Thickness: 5 µm
Negative tone Photoresist
Superior cleanliness and optical clarity
Webshop
HARE-SQ-50
Photoresist
KemLab
The HARE-SQ series is an epoxy based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications.
Film Thickness: 50 µm
Negative tone Photoresist
Superior cleanliness and optical clarity