Engineered for substrates up to 450 mm, the POLOS® SPIN500x extends the SPINx platform to large-format spin coating applications. Its modular design, advanced functionality, and automation-ready features make it a versatile choice for both R&D environments and high-volume manufacturing.
The SPIN500x is configured exclusively as an Advanced model and is designed to provide dependable process consistency, coating uniformity, and control. The standard system is manufactured from Natural Polypropylene (NPP), while an optional PTFE construction is available for processes involving more aggressive chemicals.
With support for round wafers up to 450 mm and square substrates up to 350 × 350 mm, the SPIN500x accommodates a wide range of large-format processing requirements. Its adaptable configuration also makes it suitable for integration into automated production workflows.
Adaptable installation and accessories
The SPIN500x is designed to fit different laboratory and production layouts. Its outer housing and integrated drainage system allow the processor to be converted between tabletop and in-deck installation. Optional accessories provide additional flexibility for dispensing and handling, allowing users to tailor the system to their specific processes.
Seamless integration into automated workflows
Automation compatibility is built into the SPINx design. Programmable motor homing positions help align the processor with robotic wafer handling systems, supporting accurate and repeatable substrate transfer. The vacuum chuck is positioned above the bowl rim, making substrates readily accessible for manual handling tools or robotic end-effectors.
Convenient, programmable lid operation
For greater operating convenience, the lid can be opened and closed using the touchscreen or an optional foot pedal. This is particularly useful in glovebox applications or wherever hands-free operation is preferred. The lid can also be programmed to open automatically after a recipe is completed, reducing operator interaction between process steps.
Protection for critical components
The integrated liquid filter trap provides an additional layer of protection for the vacuum system. It intercepts accidental liquid ingress before it can reach sensitive components, including the drive unit, vacuum sensor, valve, and ServoBL Controller. A removable collection container, visible through a side window, makes it easy to check accumulated liquid during routine maintenance.
SPIN500x hardware specifications
Process chamber
- Natural Polypropylene (NPP) as standard
- Optional PTFE construction
- Supports wafers up to 450 mm (15”) or square substrates up to 350 × 350 mm
- Integrated liquid filter trap
- Automatic lid with optional foot-pedal operation
- Programmable motor homing
- Center-mounted syringe or dispense nozzle holder
- Lid lock and vacuum sensor
- Detachable touchscreen display
- USB connection for recipe storage and software updates
Drive unit
- Clockwise and counterclockwise rotation
- Puddle mode
- Convertible tabletop or in-deck configuration
