POLOS HOTPLATE 350 Advanced - 110 VAC

Product description

Our all NEW table-top hotplate is a versatile and affordable tool for R&D and pilot lines. It is designed with a hinged lid with N2 connector and is suitable for soft bake as well as hard bake processes, and curing of photoresist, epoxy or any other work requiring precise temperature control. The POLOS® Hotplate 350 also has upgradeable options, including lifting pins, vacuum bake and proximity pins.

HOTPLATE 350 Advanced - 110 VAC

  • Temperature Range 50 - 230°C
  • Programmable storage of 20 programs (Temperature/Time)
  • Countdown timer (1-999 sec.) with acoustic alarm
  • Temperature Uniformity ±1°C
  • Heater Surface Area 350 x 350 mm
  • Suitable for 1 x 300 mm Wafer
  • Equipped with programmable (electric) Lifting Pins set in radius to be defined
  • Equipped with Proximity Pins to hold the wafer above the heating plate while baking
  • Equipped with perforated vacuum plate to realize a hard contact bake
  • Power: max. 1200 W (approx. 550 W to remain at 200°C)
  • Voltage: 110 VAC
  • Heater Block Material: Aluminum (anodized)
  • Housing Material: Stainless Steel
  • Including Hinged Lid with N2 connection
  • Weight: 20kg

 

POLOS HOTPLATE 350 Advanced - 110 VAC

Choose your size:
Suitable for soft bake and hard bake processes
Designed with a hinged lid with N2 connector
Programmable storage of 20 programs
Upgradeable options include: lifting pins, vacuum bake and proximity pins

Specifications

Product Number
POLOS-HP350AD-110VAC
Material
Aluminum (anodized) (Housing: Stainless Steel)
Max. Substrate size
Up to 300 mm
VAC
110 VAC
Temperature range
50 - 230°C
Status
Request information