POLOS 450 Advanced Single Substrate Spin Processor, Desktop version with NPP housing, spincup, manual chemical dispense and heavy duty motor. An aerodynamically efficient chamber enhances uniformity, while the natural polypropylene or Stainless Steel process chamber guarantees a contamination-free, easy to clean process area. All units feature programmable CW & CCW Rotation and puddle function.
Most suitable for drying, rinse/cleaning and automatic coating
Specifications:
- Up to 500 mm round and 350 x 350 mm square substrates
- Material: Natural Polypropylene (High grade NPP, tool body and all wetted surfaces)
- Manual chemical dispense 2 automatic static dispense lines
- Pneumatic lid opening and closing
- Chuck adapter and one vacuum chuck for up to 3 wafer sizes
- Speed max 1500 rpm
- Automatic Sequential or Parallel Chemical Dispensee
- Transparent Lid with 6x injector assemblies around centre. (Each programmable independently)
- CW & CCW Puddle Rotation
- (Detachable) Colour Touchscreen with Customisable Icons
- Standard 1" Drain Connection
- Precision Digital Motor Controller (max 1,500 rpm)
- Separate module for housing 6x peristaltic pumps
