At POLOS® we offer an epoxy based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications. It is designed for use in thick film applications of 2 to 100 μm, and is ideal for use in permanent applications in which the photoresist remains within the finished device.
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SPS Europe B.V.
+31 341 360 590
SPS America Inc.
+1 503 502-5722
SPS Asia Technology Pte Ltd.
+65 911 30 172
POLOS provides high-end equipment for the Semiconductor, Life Science, food, laboratories and pharmaceutical industries especially targeted to support; Universities, R&D institutes and small production facilities. Our portfolio consists of user-friendly and highly durable systems, mainly within the Photolithography and dispositioning process area. POLOS was established in 2003, with the start of our first product line; the Single Wafer Spin Coating Systems. As of today, over 4.000 units of these systems have been sold worldwide. Over the years, we have been fortunate to introduce many other new POLOS products. We carefully develop our equipment, based on long-term experience and user feedback, to support your process.
