Spin Coater Applications
Single substrate spin processing is widely used in the semiconductor industry, where spin coating can be used to create thin films less than 10nm thick. Spin processing can be used for cleaning or etching. Most substrates can be spin processed, including wafers, microscopeslides, photomasks, or even small pieces etc.
Our POLOS spin coaters are used for both cleaning applications as well as photolithography, to deposit layers of photoresist typically 1 micrometer thick. POLOS® spin coaters are available for all sizes, ranging from small pieces to large 450 mm diameter substrates. Check out our pages below to learn more about spin coating processes and when they are applied.
