The POLOS® PM-100 sets a new benchmark in maskless laser lithography by delivering one of the smallest laser spot sizes available on the market. Designed for applications that demand extreme precision, this advanced UV laser writer gives users exceptional freedom when creating fine microstructures in photo-sensitive materials.
Housed in a compact tabletop enclosure, the PM-100 integrates all critical components directly into the system frame, enabling fast installation and straightforward operation. The system is supplied complete with a Microsoft Windows–based control PC and intuitive software, allowing users to start patterning immediately.
At the core of the PM-100 is a 405 nm optical module capable of producing features down to 300 nm in photoresist layers. The system supports both grayscale exposure with up to 4095 intensity levels and binary operation, making it suitable for complex 3D optical elements, surface relief structures, and direct-write mask fabrication. Continuous laser-controlled autofocus and active power regulation maintain consistent imaging quality throughout the entire exposure process.
Key benefits
- Market-leading resolution using a 405 nm laser source
- Optional 375 nm wavelength for demanding resist applications
- Low maintenance requirements for reduced operating costs
- Compact optical module design enables rapid replacement and minimal downtime
- Intuitive user interface for efficient daily operation
- Supports substrates up to 4” × 4”
System Specifications
- Width: 600 mm
- Height: 750 mm
- Depth: 600 mm (excluding optional air duct)
- Weight: 260 kg
- Compressed air: 5 - 7 Bar,
- Air quality: ISO8573-1:2010 class 3 or better.
