The POLOS® MicroPrinter is a high end/low cost maskless lithography device for rapid prototyping, based on µLCD projection technology, compatible with a wide range of resists and substrates. Our system can produce any 2D shapes at micron resolution without the need for a hardmask.
Key features
- Writing resolution down to 2 µm
- Adjustable writing field and resolution with exchangeable objectives
- Compatible with CAD files or bitmap images
- Compatible with g-line photo resists
- Compatible with a wide range of substrates (silicon, glass, metal, plastic, ...)
- Compatible with any sample size up to 4” wafer
- Camera feedback for alignment steps
Key benefits
- Time and money saving due to the absence of a hard-mask
- lntuitive alignment method with direct overlay of the design on the sample
- Table-top with very small foot print
- Technology well suited for microelectronics, 2D-materials, microfluidics, optoelectronics, opties or any other 2D microfabrication application Micro-fabrication system
- Light source: Exposure: 435 nm; alignment: 525 nm
- Minimum feature size: Adjustable from 2 to 23 µm
- Alignment resolution: Down to 1 µm/cm2
- Maximum exposure area: 75 x 75 mm2
- Substrate size: Up to 4” wafers
- System dimensions: W: (36 cm); D: (36 cm); H: (60 cm)
Options and accessories
- Multiple-sample holder (glass-slide, 4” wafer etc.)
- Objectives
- Manual or motorized Z stage with tilt correction
- Manual rotation stage (360°)