POLOS MicroPrinter

Product description

The POLOS® MicroPrinter is a high end/low cost maskless lithography device for rapid prototyping, based on µLCD projection technology, compatible with a wide range of resists and substrates. Our system can produce any 2D shapes at micron resolution without the need for a hardmask.

Key features

  • Writing resolution down to 2 µm
  • Adjustable writing field and resolution with exchangeable objectives
  • Compatible with CAD files or bitmap images
  • Compatible with g-line photo resists
  • Compatible with a wide range of substrates (silicon, glass, metal, plastic, ...)
  • Compatible with any sample size up to 4” wafer
  • Camera feedback for alignment steps

Key benefits

  • Time and money saving due to the absence of a hard-mask
  • lntuitive alignment method with direct overlay of the design on the sample
  • Table-top with very small foot print
  • Technology well suited for microelectronics, 2D-materials, microfluidics, optoelectronics, opties or any other 2D microfabrication application Micro-fabrication system
  • Light source: Exposure: 435 nm; alignment: 525 nm
  • Minimum feature size: Adjustable from 2 to 23 µm
  • Alignment resolution: Down to 1 µm/cm2
  • Maximum exposure area: 75 x 75 mm2
  • Substrate size: Up to 4” wafers
  • System dimensions: W: (36 cm); D: (36 cm); H: (60 cm)

Options and accessories

  • Multiple-sample holder (glass-slide, 4” wafer etc.)
  • Objectives
  • Manual or motorized Z stage with tilt correction
  • Manual rotation stage (360°)

POLOS MicroPrinter

Compatible with a wide range of resists and substrates
No need for a hardmask
Writing resolution down to 2 µm
Table-top with very small foot print


Product number
POLOS MicroPrinter
Table-top System
Max substrate size
100 x 100 mm
2 - 23 µm
435 nm
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