The MDA-400M is designed for research organizations who want to work with a state of the art technology mask aligner. This highly accurate system allows researchers to easily develop their processes on either small substrate pieces or wafers up to 4".
Our manual control MDA-400M series standard feature UV Light source 350 nm to 450 nm, 365 nm
Intensity: 20-30 mW/cm2 and a beam size of 6.25” x 6.25” (3% beam uniformity for 4” wafers) and automatic exposure system. The unit comes with a Dual CCD zoom microscope with 19” LCD monitor:
magnification; 5X-20X digital CCD.
Contact modes include Soft, Vacuum Hard and Proximity. The Vacuum and Hard Contact are adjustable with an alignment accuracy of <1.0 micron.
Options
- Anti-Vibration table
- UV Intensity Meter
- UV-LED (365 nm) Exposure Module
