POLOS

POLOS HOTPLATE 200 Advanced

Product description

Our all NEW table-top hotplate is a versatile and affordable tool for R&D and pilot lines. It is designed with a hinged lid with N2 connector and is suitable for soft bake as well as hard bake processes, and curing of photoresist, epoxy or any other work requiring precise temperature control. The POLOS® Hotplate 200 also has upgradeable options, including lifting pins, vacuum bake and proximity pins.

HOTPLATE 200 Advanced

  • Temperature Range 50 - 230°C
  • Programmable storage of 20 programs (Temperature/Time)
  • Countdown timer (1-999 sec.) with acoustic alarm
  • Temperature Uniformity ±1°C
  • Heater Surface Area 220 x 220 mm
  • Suitable for 1 x 200 mm Wafer
  • Equipped with programmable (electric) Lifting Pins set in radius of 82 mm
  • Equipped with Proximity Pins to hold the wafer above the heating plate while baking
  • Equipped with perforated vacuum plate to realize a hard contact bake
  • Power: max. 1200 W (approx. 550 W to remain at 200°C)
  • Voltage: 110 or 230 VAC
  • Heater Block Material: Aluminum (anodized)
  • Housing Material: Stainless Steel
  • Including Hinged Lid with N2 connection
  • Weight: 12 kg
  • Dimensions: approx. 450 x 320 x 135 mm
    *dims. are without hinged lid

 

POLOS

POLOS HOTPLATE 200 Advanced

Choose your size:
Suitable for soft bake and hard bake processes
Designed with a hinged lid with N2 connector
Programmable storage of 20 programs
Upgradeable options include: lifting pins, vacuum bake and proximity pins

Specifications

Brand
POLOS
Product Number
POLOS-HP200AD
Material
Aluminum (anodized) (Housing: Stainless Steel)
Max. Substrate size
Up to 200 mm
VAC
230 VAC
Temperature range
50 - 230°C
Status
Request information