AT410 ALD System

AT410 ALD System

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Product description

AT410 Base ALD System

Temperature-controlled all aluminum chamber, up to 330°C, with up to 4" diameter sample holder. Table-Top Atomic Layer Deposition Unit, suitable for up to 5 lines. The tool boasts capabilities that meet or exceed those found in other tools on the market, while being easy to use and maintain - at a cost well below what can be found on the market today.

Precise precursor dosing with defined dose volumes:

  • Fast cycling capability
  • 6 to 10 cycles/min or up to 1.2nm/min Al2O3 (best in class)
  • Reduces process and dose variability common to competitors


  • Substrate size up to 4" (100 mm) diameter (Other Wafer Sizes on Request!)
  • Chamber temperatures from RT to 400°C ± 1°C
  • Precursor temperatures from RT to 150°C ± 2°C (with optional heating jackets)
  • 2 Counter reactants - standard
  • 1 liquid source such as H2O or H2O2
  • 1 gas source such as O2 or NH3
  • 2 gas sources can be used as well
  • Variable process pressure control 0.1 to 1.5Torr
  • All metal sealed system upstream of sample
  • Up to 3x Heated sources
  • Volume controlled dosing (Volume control yields more repeatable precursor doses)
  • Valve time controlled dosing
  • Exposure Control
  • Point source Gas Distribution with Optimal Spreading for superior film uniformity
  • Integrated, angled HMI/PLC SW/Controls (prevents random SW lockups)
  • Robust 7" touchscreen PLC control system
  • Recipe Control: proven recipes pre-loaded in controller
  • Smallest Footprint on the market: 55 cm (W) x 55 cm (D) X 39 cm (H)
  • Cleanroom Compatible
  • Weight 45 kgs

Simple system maintenance and integrated vacuum interlock.
Excellent Process Development Support (Harvard lab scientsts provide evidence based assistance to customers)

AT410 ALD System

Suitable for up to 5 lines
Large substrate and precursor temperature ranges
Fast cycling capability
Glovebox integration optional


Product Number
Max. substrate size
Max. temperature
Up to 330°C
System type
Table-top System
Request information


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Stand-alone system