Table-top Atomic Layer Deposition System 2 inch
Meet the smallest footprint ALD tool available on the market. The AT200M is specifically designed for simple operation and installation with a focus on educational and metrology markets where small size and cost effectiveness are the largest concerns.
The AT200M maintains the same semiconductor grade components, metal-sealed lines and a robust PLC driven user interface that yields fast cycling and high quality single component thin films, while still realizing easy maintenance and safe, repeatable operation.
Features
- Small Footprint Desktop Thermal ALD system W: 14" (35.5 cm) x D: 15" (38.1 cm) x H: 14.5" (36.8 cm)
- Powder Coating Option (capacity Up to ~ 10 cm^3)
- Accommodates samples from 2" x 2" x 3" or two 2" round wafers (customizable chucks and our powder coating option)
- 2 precursor ports, 4 ports optional with heat traced lines up to 150°C (HT kit to 180°C)
- Upgradeable to hollow cathode plasma (optional)
- Vented Precursor enclosure
- High temperature compatible fast pulsing ALD valves with ultrafast MFC for integrated inert gas purge - standard
- All stainless steel chamber with temperature range to 300°C
- High exposure available with static processing mode
- 5" Display with integrated PLC control
- Lifetime SW upgrades included
- 1 year warranty (parts and labor included)
Options
- Vacuum pump
- *4 port manifold
- Ozone generator (AT-O3)
- Battle heaters • QCM
- Remote PC control
- ALD precursors
- Glovebox
- HT Kit (precursors to 180°C)
- Bubbler
- Powder coater
- HC plasma
